A multi-exposure drawing apparatus for drawing a given pattern on a workpiece
is
provided. The apparatus uses an exposure unit with optical modulation elements
arranged in a matrix. The apparatus comprises a first, second, and third memory,
a coordinate transformation processor, a calculation processor, and an exposure-data
generating processor. The first, second, and third memory respectively stores raster-data
of the given pattern, first-coordinate data representing a position of each optical
modulation element, and second-coordinate data representing a position of the exposure
unit. The coordinate transformation is performed for the first-coordinate data.
Address-data is calculated in accordance with a pixel size of the raster-data,
and is based on the sum of the first and second coordinate data. Exposure-data
generated by outputting the raster-data of the address-data is given to each of
the optical modulation elements. The given pattern is drawn on the drawing surface
as to the exposure-data.
