Method of forming a thin film transistor substrate with a interconnection electrode

   
   

A thin film transistor substrate including a semiconductor layer having a source region and a drain region, an insulating film and a gate electrode which are formed on the semiconductor layer, an interlayer insulating film which is a film stack with mutually different dielectric constants and which covers the gate electrode, a source region contact hole and a drain region contact hole which are formed on the interlayer insulating film, a pixel electrode connected to the source region through the source region contact hole, a first conductive film connected to the drain region through the drain region contact hole and formed of the same film as that of the pixel electrode, and a second conductive film connected to the drain region through the first conductive film.

 
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