Disclosed are data processing method, apparatus, and computer readable
medium for generating data about mask, reticle, etc., for making exposure, and
exposing method, apparatus and computer readable medium for performing exposure
during manufacture of LSI, semiconductor device, magnetic device, liquid crystal,
etc. When generating revision exposure data from design data, the correction position
of revision data is designated and data processing of only designated correction
portion is performed. Positional information of correction portion is added to
header or footer section of revision exposure data.
