Illumination optical system, exposure apparatus having the same, and device fabricating method

   
   

An illumination optical system for illuminating a reticle using light from a light source includes an illumination-light generating mechanism for generating a light amount distribution on a plane that has a substantially Fourier conversion relationship with the reticle while making variable a ratio of a light amount between a first area and a second area different from the first area, the first and second areas being on the plane.

 
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