Chemical amplification type positive resist composition
A chemical amplification type positive resist composition comprising:
(A) a resin which itself is insoluble or poorly soluble in an alkali
aqueous solution but becomes soluble in an alkali aqueous solution by the action
of an acid, and which contains a structural unit derived from p-hydroxystyrene
and a structural unit represented by the formula (Ia) or (Ib)
##STR1##
wherein R1 and R2 each independently represents hydrogen
or methyl, and R3 to R5 each independently represents alkyl
having 1 to 8 carbon atoms; and
(B) radiation-sensitive acid generator comprising sulfonic acid ester
of N-hydroxyimide compound; and onium salt is provided.
