Method for reducing the surface of silicon dioxide
   
   

There is described a method for reducing the surface area of silicon dioxide, which is characterized in that silicon dioxide is introduced into an electromagnetic shielding device selected from an aluminum/magnesium metal shielding device and a hypomagnetic chamber of Permalloy steel, and is incubated for a period of at least 3 hours, preferably at least 6 hours.

 
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