A ferulic acid derivative represented by the general formula (1); a process for
preparing a ferulic acid derivative represented by the general formula (1), comprising
reacting ferulic acid or an ester thereof represented by the general formula (2)
with a dihalomethane represented by the general formula CH2X2,
wherein X is a halogen atom; and an ultraviolet light-absorbent composition comprising
the ferulic acid derivative. Since the ultraviolet light absorbent composition
is not only excellent in the ultraviolet light absorption but also very stable
against heat, the ultraviolet light absorbent composition can be suitably used
as cosmetics which especially require long-term stability.
