The invention provides an electric optical apparatus and a manufacturing method
thereof, in which, when forming a contact hole by wet etching to control an electric
potential of a light-shielding layer, etching liquid does not infiltrate the bonding
boundary between a supporting substrate and a semiconductor substrate. An electric
optical apparatus includes a first insulator layer formed on an underside of a
semiconductor layer, a second insulator layer formed on a side lower than the first
insulator layer, a light-shielding layer formed between the first insulator layer
and the second insulator layer, and a contact hole passing through at least the
first insulator layer to the light-shielding layer. The light-shielding layer is
located at a position upper than that of the bonding boundary between a supporting
substrate and a semiconductor substrate.
