Provided are a lift pin capable of preventing aluminum from depositing on
the lift pin when depositing a metallic layer on a wafer through chemical
vapor deposition. a system using the lift pin, and a method of
manufacturing the same. The lift pin is made of stainless steel and is
oxidized at a predetermined temperature for a predetermined time, such
that the lift pin is not deposited with aluminum during a CVD process.
Since the CVD vacuum processing chamber utilizes the heater and the lift
pin which are made of oxidized SUS material, aluminum does not deposit on
the heater and the lift. Therefore, when the lift pin is lowered, the
lift pin is not lowered by its own weight, thereby preventing a wafer
from being broken. Also, the lift pin is prevented from being ruptured by
a robot moving in and out of an opening of the CVD vacuum processing
chamber.
