Low firing temperature thick film dielectric layer for electroluminescent display

   
   

The present invention is a low firing temperature, composite thick film dielectric layer for an electroluminescent display. The composite thick film dielectric layer comprises;

    • (a) a lower zone layer of a thick film composition comprising;
      • one or more of lead magnesium niobate (PMN), lead magnesium niobate-titanate (PMN-PT), lead titanate, barium titanate and lead oxide; and
      • a glass frit composition comprising lead oxide, boron oxide and silicon dioxide;
    • (b) an upper zone comprising at least one layer of lead zirconate titanate (PZT) and/or barium titanate; and
    • (c) an intermediate composite zone comprising a composite of (a) and (b).
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