A maskless plasma-formed ion beam lithography tool provides for patterning of
sub-50
nm features on large area flat or curved substrate surfaces. The system is very
compact and does not require an accelerator column and electrostatic beam scanning
components. The patterns are formed by switching beamlets on or off from a two
electrode blanking system with the substrate being scanned mechanically in one
dimension. This arrangement can provide a maskless nano-beam lithography tool for
economic and high throughput processing.
