A method of fabricating an X-ray detecting device that is capable of preventing
breakage of a transparent electrode. In the method, patterning of first and second
insulating films occurs at different etching rates, with an etching ratio of the
second insulating material to the first insulating material being greater than
1. Accordingly, undercut of the first and second insulating materials can be prevented.
This stabilizes the step coverage of a subsequently formed transparent electrode.
