An exposure method for exposing a pattern onto plural portions on an object includes the steps of obtaining first flatness information about the plural portions, specifying a portion among the plural portions, which has flatness information that meets a predetermined condition among the first flatness information, obtaining second flatness information that is more detailed than the first flatness information about the portion specified by the specifying step, and exposing, based on the second flatness information, the portion that has been specified.

 
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> Electrophoretic display device

> Lens system and camera having the same

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