A scanning exposure apparatus for exposing a substrate to a pattern includes an exposure system which exposes the substrate to the pattern with respect to a unit region of the substrate to which the pattern is transferred, a determination system which determines whether a condition of an exposure performed by the exposure system is allowable during the exposure, and a control system which causes the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the determination system makes a negative determination for the unit region.