A scanning pattern generator and a method for microlithographic multi-beam writing
of high precision patterns on a photosensitive substrate (11), the system
comprising a light source (1), preferably a laser, for generating at least
two light beams, a computer-controlled light modulator (4), a deflector
for scanning the beams on the substrate and an objective lens (10) to contract
the at least one light beam from the light source before it reaches the substrate,
wherein at least the objective lens is arranged on a carrier (22) being
movable relative to the substrate (11) and the light source (1).
Hereby, the carrier defines a movable optical path relative to the remaining, stationary
optical path. Further, the system comprises means for altering the stationary optical
path in order to maintain telecentricity for the beams as they impinge on the photosensitive
substrate during the movement of the carrier and the movable optical path.