In the calibration and alignment of an X-ray reflectometry ("XRR") system for
measuring thin films, an approach is presented for accurately determining C0
for each sample placement and for finding the incident X-ray intensity corresponding
to each pixel of a detector array and thus permitting an amplitude calibration
of the reflectometer system. Another approach involves aligning an angle-resolved
X-ray reflectometer using a focusing optic, such as a Johansson crystal. Another
approach relates to validating the focusing optic. Another approach relates to
the alignment of the focusing optic with the X-ray source. Another approach concerns
the correction of measurements errors caused by the tilt or slope of the sample.
Yet another approach concerns the calibration of the vertical position of the sample.