A Group III nitride compound semiconductor light-emitting device includes a multilayer having a quantum well structure containing an InGaN well layer and an AlGaN barrier layer. The film thickness, growth rate and growth temperature of the InGaN layer as the well layer and the film thickness of the AlGaN layer as the barrier layer are controlled to be optimized to thereby improve an output of the light-emitting device.

 
Web www.patentalert.com

< Method of forming a cap layer having anti-reflective characteristics on top of a low-k dielectric

< Resistance variable device

> Transition metal alloys for use as a gate electrode and devices incorporating these alloys

> Chip scale packaging with improved heat dissipation capability

~ 00255