A polymer comprising recurring units having a partial structure of formula (1) wherein R.sup.1 is a single bond or alkylene or fluoroalkylene, R.sup.2 and R.sup.3 are H or alkyl or fluoroalkyl, at least one of R.sup.2 and R.sup.3 contains at least one fluorine atom is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance ##STR00001##