A method is provided for measuring Mueller Matrix of an optical system of an exposure apparatus. Light flux from a light source is serially converted into any of a plurality of polarized light beams perpendicular to each other on Poincare sphere and is output. This polarized light beam is injected into a projection optical system or the like to be converted into a converted polarized light beam based on Mueller matrix of each optical system. With a linear polarizer or a linear phase retarder being properly inserted into an optical path of the converted polarized light beam, a light intensity is measured. Stokes parameters of the converted polarized light beam are calculated based on the measured light intensity.

 
Web www.patentalert.com

< Measuring method and apparatus using attenuated total reflection

< Electro-optic array interface

> Sample orientation system and method

> Non-contact optical profilometer with orthogonal beams

~ 00279