A method for producing a tantalum sputtering component includes a minimum
of three stages each of which include a deformation step followed by an
inert atmosphere high-temperature anneal. Temperatures of each of the
anneal steps can be different from one another. A tantalum sputtering
component includes a mean grain size of less than about 100 microns and a
uniform texture throughout the component thickness. The uniform texture
can be predominately {111}.