A semiconductor device comprises a protective element on a substrate; a low-k dielectric film opposite the protective element and having mechanical strength smaller than a silicon oxide film; a mesh wiring opposite the protective element and in the low-k dielectric film, the mesh wiring including power supply wirings and ground wirings arranged in a mesh, the mesh wiring being electrically connected to the protective element; a silicon oxide film on the mesh wiring and the low-k dielectric film; and a bonding pad on the silicon oxide film and opposite the mesh wiring.