A layer configuration on a support, the layer configuration comprising a layer containing a polymer containing optionally substituted 3,4-alkylenedioxythiophene structural units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, and a compound selected from the group consisting of polyphosphoric acids, polyphosphoric acid salts, thia-alkanedicarboxylic acids, cyclohexadiene compounds and polyhydroxy-compounds selected from the group consisting of tetronic acid derivatives; ortho-dihydroxybenzene compounds with at least one sulpho group, compounds according to formula (I): HO--CH.sub.2--CH(OH)--(CH.sub.2).sub.m--S--CH.sub.2--C(R.sup.1)(R.sup.2)-- -CH.sub.2--S--(CH.sub.2).sub.n--CH(OH)--CH.sub.2--OH (I) wherein R.sup.1 and R.sup.2 are independently H, --OH or alkyl, and n and m are independently 1, 2 or 3; compounds according to formula (II): HO--(CH.sub.2).sub.p--S--CH.sub.2--S--(CH.sub.2).sub.q--OH (II) wherein p and q are independently 2, 3 or 4; compounds hydrolyzable to tetronic acid derivatives; compounds hydrolyzable to compounds according to formula (I); and sulpho-substituted 2-thia-alkyl-benzimidazole compounds.

 
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> Method to reduce adhesion between a conformable region and a pattern of a mold

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