A method of amplitude modulated electrostatic polymer nanolithography providing rapid creation of features in a polymer film is disclosed. The nanolithography method of the present invention generates features by mass transport of polymer within an initially uniform, planar film via localized softening of attoliters (10.sup.2-10.sup.5 nm.sup.3) of polymer by Joule heating enabling high data densities upon the surface of the polymer. This localized Joule heating is accomplished by current flow between the cantilever AFM tip and a conductive wafer upon which the layer of polymer is grown or mounted.

 
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> Multilayered surface-enhanced Raman scattering substrates

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