A method for treating CIP equipment is provided according to the present invention. The CIP equipment includes process equipment. The method includes steps of treating the CIP equipment with a multiple phase treating composition comprising a treating liquid phase and a treating gaseous phase and rinsing the CIP equipment with a multiple phase rinsing composition comprising a rinsing liquid phase and a rinsing gaseous phase.

 
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> Method for controlling the integrity of a nanofiltration or reverse osmosis module, or module system

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