Four types of optical systems, a polarization optical system including an objective lens having a high numerical aperture, a polarization optical system including an objective lens having a low numerical aperture, a non-polarization optical system including an objective lens having a high numerical aperture and a non-polarization optical system including an objective lens having a low numerical aperture, are selectively used at the time of irradiating light from a semiconductor laser on a target disk for measurement, and the in-plane birefringence characteristic and perpendicular birefringence characteristic of the target disk are separately acquired based on the amounts of received light obtained by measuring reflected light from the target disk by a photosensor.

 
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> Exposure apparatus of an optical disk master, method of exposing an optical disk master and pinhole mechanism

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