A system and method to facilitate pattern recognition or matching between patterns are disclosed that is substantially invariant to small transformations. A substantially smooth deformation field is applied to a derivative of a first pattern and a resulting deformation component is added to the first pattern to derive a first deformed pattern. An indication of similarity between the first pattern and a second pattern may be determined by minimizing the distance between the first deformed pattern and the second pattern with respect to deformation coefficients associated with each deformed pattern. The foregoing minimization provides a system (e.g., linear) that may be solved with standard methods.

 
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> Face annotation for photo management

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