A computer implemented method for correcting a mask pattern, includes: preparing a designed mask pattern; obtaining a rough corrected mask pattern from the designed mask pattern by applying a rough correction; and obtaining a precision corrected mask pattern from the rough corrected mask pattern by applying a precision correction using a model based correction method with a precision model that simulates a transferred image of an exposure apparatus.

 
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< Reviewing and changing the outcome of a digital signal processing operation

> Method and apparatus to eliminate discontinuities in adaptively filtered signals

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