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A method for manufacturing a wiring substrate includes the steps of: (a)
forming a sacrificial layer in a first pattern on a substrate; (b)
forming a catalyst layer in a second pattern on the substrate; (c)
immersing the substrate in an electroless plating liquid, thereby
depositing a metal layer on the catalyst layer in the second pattern; and
(d) heating to remove the sacrificial layer and to form a metal layer in
a third pattern, wherein the third pattern is a region where the first
pattern and the second pattern overlap each other.
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< Coloring Matter, Ink, Ink, for Ink Jet, Ink Jet Recording Method, Color Toner, and Color Filter
> SILICONE-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, SILICON-CONTAINING FILM-BEARING SUBSTRATE, AND PATTERNING METHOD
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~ 00473
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