The present invention provides a distribution manifold for thin-film
material deposition onto a substrate comprising a plurality of inlet
ports for a sequence of gaseous materials, an output face comprising a
plurality of open elongated output channels, each channel extending in a
length direction substantially in parallel. The distribution manifold can
be employed in a deposition system for thin film deposition, further
comprising a plurality of sources for a plurality of gaseous materials
and a support for positioning a substrate in pre-designed close proximity
to the output face of the distribution manifold. During operation of the
system, relative movement between the output face and the substrate
support is accomplished.