The disclosed embodiments reduce across-chip performance variation through
non-contact electrical metrology. According to a feature is a process
control system that includes a component that measures transistor
electrical performance in a product wafer. Also included in the system is
a mapping component that converts the transistor performance into
exposure dose values and a process tool that communicates the exposure
dose value to a scanner. The exposure dose value is fed back for
optimization of future chip exposures. The disclosed embodiments directly
optimize transistor performance, thus controlling an important parameter
in many integrated circuits.