A fully-depleted (FD) Silicon-on-Insulator (SOI) MOSFET access transistor comprising a gate electrode of a conductivity type which is opposite the conductivity type of the source/drain regions and a method of fabrication are disclosed.

 
Web www.patentalert.com

< Method of forming backside point contact structures for silicon solar cells

> Method for forming a silicon oxide layer using spin-on glass

> Encapsulation for organic device

~ 00511