A method for fabricating point contacts to the rear surface of a silicon solar cell by coating the rear surface with a masking layer and a laser absorptive layer and directing laser radiation to the rear surface to form openings therein after which doping material is applied through the openings and contacts are applied. The doping is preferably performed by plasma immersion ion implantation.

 
Web www.patentalert.com

< Apparatus for modifying and measuring diamond and other workpiece surfaces with nanoscale precision

> Fully-depleted (FD) (SOI) MOSFET access transistor and method of fabrication

> Method for forming a silicon oxide layer using spin-on glass

~ 00511