A measurement probe 1 for measuring a surface of sample S comprises a base section 10, a head section 30 having a probe tip 31, and a support structure section 15 which supports the head section 30 with the base section 10 along a support axis substantially orthogonal to the vertical axis in the direction of protrusion of the probe tip 31. The support structure section 15 includes two spring structure sections of a first spring structure section 20 deformable in the direction of the vertical axis; and a second spring structure section 25 deformable in the direction of the lateral axis, and a reflection surface 32 which is formed with a reflection pattern varying the reflectance within the surface is provided at the side opposite to the probe tip 31 of the head section 30. By using this structure, there are obtained the measurement probe, the sample surface measuring apparatus, and the sample surface measuring method, which can improve the accuracy of measurement of the sample surface without using a special measuring system.

 
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< Apparatus for measuring semiconductor physical characteristics

> Beam chromatic shifting and directing means

> One dimensional measuring unit having a dielectric block

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