In the exposure data preparation method for charged particle beam exposure
in which an exposure object is exposed while dose is adjusted for each
pattern, the method including the steps of: classifying a pattern in
terms of a target linewidth; setting a standard characteristic showing
the relationship between a standard dose and a resultant linewidth of a
resist pattern for a group of patterns having the target linewidth; and
preparing exposure data by correcting a shape and dose so that a
characteristic showing the relationship between dose of each pattern
having the target linewidth and a resultant linewidth of a resist pattern
follows the standard characteristic.