A diagnostic method of and computer system for root-cause analysis of
performance variations of FETs in integrated circuits and a method and
computer system for monitoring a field effect transistor manufacturing
process. The diagnostic method includes measuring source currents in the
linear and saturated regions of two FETs, calculating ratios of the
source currents in the linear and saturated regions for the and two FETs
and comparing the ratios of the two FETs to determine a probable root
cause for a performance variation between the two FETs. One of the FETs
has a known good performance.