A rotary type CVD film forming apparatus for mass production, wherein a
film forming chamber is formed by providing one columnar body having a
plurality of housing spaces for housing one plastic container each in one
said housing space, a plurality of said film forming chambers is arranged
on a rotation support body at equal intervals in a circular state, source
gas introduction means serving as an external electrode which introduce a
source gas that is converted to plasma inside the plastic containers
housed in each of said film forming chambers is provided, and high
frequency supply means which supply a high frequency to the external
electrode of each of said film forming chambers is provided to form a CVD
(chemical vapor growing) film on the internal surfaces of said plastic
containers.