An apparatus and methods for nanolithography using nanoscale optics are disclosed herein. Submicron-scale structures may be obtained using standard photolithography systems with a de-magnifying lens. A de-magnifying lens for use in a standard photolithography system includes a film having a top surface, a bottom surface and a plurality of cylindrical channels containing a dielectric material; and an array of carbon nanotubes penetrating the film through the plurality of cylindrical channels, wherein an image on the top surface of the film is converted into a de-magnified image on the bottom surface of the film by the carbon nanotubes.