Provided are relatively higher-performance wire-type semiconductor devices and relatively economical methods of fabricating the same. A wire-type semiconductor device may include at least one pair of support pillars protruding above a semiconductor substrate, at least one fin protruding above the semiconductor substrate and having ends connected to the at least one pair of support pillars, at least one semiconductor wire having ends connected to the at least one pair of support pillars and being separated from the at least one fin, a common gate electrode surrounding the surface of the at least one semiconductor wire, and a gate insulating layer between the at least one semiconductor wire and the common gate electrode.

 
Web www.patentalert.com

< Epitaxial semiconductor structures having reduced stacking fault nucleation sites

> Method and apparatus for electrostatic discharge protection having a stable breakdown voltage and low snapback voltage

> Semiconductor integrated circuit device

~ 00581