A vertical semiconductor element comprises: an electro-conductive substrate; a GaN layer, as a nitride compound semiconductor layer, which is selectively grown as a convex shape on one surface of the electro-conductive substrate through a buffer layer; a source electrode as a first electrode formed on the GaN layer; and a drain electrode as a second electrode formed on another surface of the electro-conductive substrate.

 
Web www.patentalert.com

< Thin-film transistor and fabrication method thereof

> Integrated circuit devices including a capacitor

> Back-gated semiconductor device with a storage layer and methods for forming thereof

~ 00589