A nanocrystal memory element and a method for fabricating the same are proposed. The fabricating method involves selectively oxidizing polysilicon not disposed beneath and not covered with a plurality of metal nanocrystals, and leaving intact the polysilicon disposed beneath and thereby covered with the plurality of metal nanocrystals, with a view to forming double layered silicon-metal nanocrystals by self-alignment.

 
Web www.patentalert.com

< Vertical Fin-FET MOS devices

> Semiconductor device having a metal carbide gate with an electropositive element and a method of making the same

> Semiconductor device and method for fabricating the same

~ 00589