A method for detecting the presence of side lobes in a full chip layout having a main pattern designed on a mask includes surrounding the main pattern with a pattern of polygons or circles. A lithography rule check is performed and uses the pattern of polygons or circles to search the main pattern for side lobes. The location of a side lobe is preferably marked with an error flag.

 
Web www.patentalert.com

< Glom widget

< Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layout

> Centralized fine-grained enhancements for distributed table driven I/O mapping

> System and method of remotely managing and loading artifacts
~ 00607