Polymers, chemical amplification resist compositions and patterning process

   
   

Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. ##STR1## R.sup.1, R.sup.2 and R.sup.3 are independently H, F, C.sub.1-20 alkyl or fluorinated C.sub.1-20 alkyl, at least one of R.sup.1, R.sup.2 and R.sup.3 contains fluorine, and R.sup.4 is an acid labile group. Using such polymers, resist compositions featuring low absorption of F.sub.2 excimer laser light are obtained.

Полимеры состоя из рецидивируя блоков акрилового производного fluorinated костяка представленного формулой (1) будут романом. ## ## STR1 R.sup.1, R.sup.2 и R.sup.3 будут независимо ю, ф, алкилом C.sub.1-20 или fluorinated алкил C.sub.1-20, по крайней мере одно R.sup.1, R.sup.2 и R.sup.3 содержат фтор, и R.sup.4 будет кисловочной лабильной группой. Использующ такие полимеры, сопротивляйте составам отличая низкой абсорбциой света лазера excimer F.sub.2 получите.

 
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