A lithographic manufacturing process is disclosed in which a first
information on a first lithographic transfer function of a first
lithographic projection apparatus is obtained. The information is compared
with a second information on a second lithographic transfer function of a
second lithographic projection apparatus, for reference. The difference
between the first and second information is calculated. Then, the change
of machine settings for the first lithographic projection apparatus,
needed to minimize the difference, is calculated and applied to the first
lithographic projection apparatus such that the match between the first
and second lithographic projection apparatus of any pitch-dependency of
feature errors is improved.
