SUBSTRATE ASSEMBLY FOR ELECTROOPTICAL DEVICE, METHOD FOR MANUFACTURING SUBSTRATE ASSEMBLY FOR ELECTROOPTICAL DEVICE, ELECTROOPTICAL DEVICE, METHOD FOR MANUFACTURING ELECTROOPTICAL DEVICE, AND ELECTRONIC APPARATUS

   
   

An optically transmissive layer 212 is formed on a first substrate 211, and a slope surface 212a having a valley in cross section is formed in the optically transmissive layer 212. A reflective layer 213 having a aperture 213h on the slope surface 212a is formed on the optically transmissive layer 212. A color layer 214 is formed on the reflective layer 213. The color layer 214 has a thick portion 214a formed corresponding to the slope surface 212a of the optically transmissive layer 212.

Una capa ópticamente transmissive 212 se forma en un primer substrato 211, y una superficie 212a de la cuesta que tiene un valle en la sección transversal se forma en la capa ópticamente transmissive 212. Una capa reflexiva 213 que tiene una abertura 213h en la superficie 212a de la cuesta se forma en la capa ópticamente transmissive 212. Una capa 214 del color se forma en la capa reflexiva 213. La capa 214 del color tiene corresponder formado 214a grueso de la porción a la superficie 212a de la cuesta de la capa ópticamente transmissive 212.

 
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