Wafer transfer system of wet cleaning equipment

   
   

A wafer transfer system for use in a wet cleaning equipment frequently checks the state of alignment of wafers while the wafers are transferred between a plurality of baths. The system includes at least one transfer robot a sensor and a controller. The plurality of baths are disposed adjacent one another in one line. The transfer robot has a robot chuck that can hold a plurality of the wafers and is driven to transfer the wafers into and from each of the baths. The sensor is oriented to face the direction in which the wafers are held by the chuck at a sensing area outside of the baths. The sensor is thus operable to detect the state of alignment of flat zones of the wafers. The controller receives a detection signal from the sensor and controls respective components of the equipment, such as the transfer robot, if an alignment error is determined to exist.

 
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