Microstructure devices, methods of forming a microstructure device
and a method of forming a MEMS device are described. According to one aspect, a
microstructure device includes: a semiconductive substrate; a monolithic microstructure
device feature coupled with the semiconductive substrate, and wherein at least
a portion of the microstructure device feature is configured to move relative to
the semiconductive substrate; and a conductive structure provided directly upon
the microstructure device feature.
