Atmospheric robot handling equipment

   
   

A semiconductor-manufacturing tool has two load locks, one for semiconductor wafers entering the tool for processing and the other for wafers leaving the tool after being processed. The load locks are of a new generation capable of being evacuated or vented in shorter times than load locks of the prior art, and permit high throughput. The tool is associated with three atmospheric wafer-handling robots to obtain the high throughput permitted by the load locks. One robot transfers wafers to be processed from a supply to a wafer pre-aligner, another robot transfers wafers from the wafer pre-aligner to the load lock for wafers entering the tool, and the third transfers processed wafers from the load lock for wafers leaving the tool back to the supply.

 
Web www.patentalert.com

< Motor, robot, substrate loader, and exposure apparatus

< Apparatus for detecting distortion of transfer arm robot

> Device for correcting positional data of robot

> Method and apparatus for self-calibration of a substrate handling robot

~ 00180