A chemical mechanical polishing slurry includes liquid and abrasive solid components,
with at least some of the abrasive solid component comprising individually non-homogeneous
abrasive particles. In one implementation, the non-homogeneous abrasive particles
comprise an innermost portion and an outermost portion, with the innermost and
outermost portions comprising different materials. In one implementation, the material
of the outermost portion is harder than the material of the innermost portion.
In one implementation, the material of the outermost portion comprises TiN and
the material of the innermost portion comprises SiO2. In one implementation,
the material of the outermost portion comprises WN and the material of the innermost
portion comprises TiN. In one implementation, the material of the outermost portion
is softer than the material of the innermost portion.
