A photo-patternable perfluorinated silane sol-gel material is presented that
exhibits
a high refractive index and propagation losses below 1 dB/cm at the telecommunication
wavelengths. The sol-gels are produced with general formula [, R"; and R";
are photo cross-linkable groups, and where (CH2)n are alkyl
spacers with n being an integer 0. The sol-gels can be fabricated to produce
complex waveguide structures directly onto silica-on-silicon substrates with low
bending losses.
