A flexible metal foil substrate organic light emitting diode (OLED) display and
a method for forming the same are provided. The method comprises: supplying a metal
foil substrate such as titanium (Ti), Inconel alloy, or Kovar, having a thickness
in the range of 10 to 500 microns; planarizing the metal foil substrate surface;
depositing an electrical isolation layer having a thickness in the range of 0.5
to 2 microns overlying the planarized metal foil substrate surface; depositing
amorphous silicon having a thickness in the range of 25 to 150 nanometers (nm)
overlying the electrical insulation layer; from the amorphous silicon, forming
polycrystalline silicon overlying the electrical insulation layer; forming thin-film
transistors (TFTs) in the polycrystalline silicon; and, forming an electronic circuit
using the TFTs, such as an OLED display.
